Defect avoidance for extreme ultraviolet mask defects using intentional pattern deformation

Yoo-Jin Chae; Rik Jonckheere; Puneet Gupta

doi:10.1117/12.2501525

9 October 2018 Defect avoidance for extreme ultraviolet mask defects using intentional pattern deformation

Yoo-Jin Chae, Rik Jonckheere, Puneet Gupta

Proceedings Volume 10809, International Conference on Extreme Ultraviolet Lithography 2018; 108091H (2018) https://doi.org/10.1117/12.2501525
Event: SPIE Photomask Technology + Extreme Ultraviolet Lithography, 2018, Monterey, California, United States

Abstract

Extreme ultraviolet lithography has been adopted as the next generation lithography solution to sub 10nm technology node. However, mask blank defect is a major challenge for this technology. In this work, we explore the extended benefits of utilizing pattern deformation for EUV mask defect avoidance. In the first part of the paper, we propose a constraint programming based method that can explore pattern shift, small angle rotation, and deformation for defect avoidance. In the second part of the paper, we utilized this proposed method to explore the benefit of pattern deformation. For an 8nm polysilicon layer of an ARM Cortex M0 layout, pattern deformation combined with pattern shift was able to improve mask yield by more than 90%-point compared to pattern shift alone for a 40-defect mask.

Citation Download Citation

Yoo-Jin Chae, Rik Jonckheere, and Puneet Gupta "Defect avoidance for extreme ultraviolet mask defects using intentional pattern deformation", Proc. SPIE 10809, International Conference on Extreme Ultraviolet Lithography 2018, 108091H (9 October 2018); https://doi.org/10.1117/12.2501525

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
10 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Photomasks

Computer programming

Extreme ultraviolet

Lithography

Extreme ultraviolet lithography

Metals

193nm lithography

Show All Keywords

Keywords/Phrases

Search In:

Publication Years