A true-color nano-CT based on SEM

Weixia Zhao; Junbiao Liu; Geng Niu; Yutian Ma; Yan Wang; Li Han

doi:10.1117/12.2504965

6 February 2019 A true-color nano-CT based on SEM

Weixia Zhao, Junbiao Liu, Geng Niu, Yutian Ma, Yan Wang, Li Han

Proceedings Volume 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology; 108420P (2019) https://doi.org/10.1117/12.2504965
Event: Ninth International Symposium on Advanced Optical Manufacturing and Testing Technologies (AOMATT2018), 2018, Chengdu, China

Abstract

Nano-CT provides a brand new tool for the research of biology, life sciences, archeology and artifacts, and new materials for its excellent nondestructive detecting capability, especially in the non-destructive testing of carbon and hydrogen polymer light element materials. However, typical conventional Nano-CT cannot perform high-resolution and contrast imaging on structure of materials with small differences in X-ray absorption, and the traditional color CT which can achieve this function has low ray intensity and poor image quality when observed on light-element materials. Therefore, a true-color Nano-CT based on FEI Quanta 600 SEM is proposed in this paper. Three different material targets, Cr, Cu, and W, are introduced to obtain different energy rays. High-sensitivity CCD detector and single-circle scanning method are used to acquire projection data and reconstruct three CT images with different energies. Finally, principal component analysis (PCA) algorithm is used to extract the three principal components as color and the three primary colors of the image are combined to form a true-color image. The true-color Nano-CT can perform high-resolution imaging of substances with similar attenuation coefficients but different compositions with high resolution.

Citation Download Citation

Weixia Zhao, Junbiao Liu, Geng Niu, Yutian Ma, Yan Wang, and Li Han "A true-color nano-CT based on SEM", Proc. SPIE 10842, 9th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Subdiffraction-limited Plasmonic Lithography and Innovative Manufacturing Technology, 108420P (6 February 2019); https://doi.org/10.1117/12.2504965

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