MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)

Christof Klein; Hans Loeschner; Elmar Platzgummer

doi:10.1117/12.2516033

2 December 2019 MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)

Christof Klein, Hans Loeschner, Elmar Platzgummer

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Proceedings Volume 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019; 109580K (2019) https://doi.org/10.1117/12.2516033
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

Publisher’s Note: This video, originally published on 16 August 2019, was withdrawn per author request.

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Christof Klein, Hans Loeschner, and Elmar Platzgummer "MBMW-201: The next generation multi-beam mask writer (Conference Presentation) (Withdrawal Notice)", Proc. SPIE 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019, 109580K (2 December 2019); https://doi.org/10.1117/12.2516033

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