Entegris has recently developed several innovative membranes: a next generation UPE and OktolexTM. The next generation UPE overcomes the trade-off between flow rate and pore size, while also being compatible with a range of chemistries. OktolexTM selectively removes defects based on tailored membrane modification technology, further addressing defect sources that come from newly formulated chemistries. In this paper, these innovative technologies are introduced to address the challenges of advanced photoresist defectivity by enhancing filtration performance. Results and possible mechanisms of defect reduction will be discussed. |
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Photoresist materials
Particles
Manufacturing
Metals
Adsorption
Filtering (signal processing)
Optical lithography