Annealing effects on optical and structural properties of TiO2 thin films deposited by ion beam sputtering

Yugang Jiang; Jiahuan He; Lishuan Wang; Shida Li; Dan Chen; Meiping Zhu; Huasong Liu

doi:10.1117/12.2539044

8 July 2019 Annealing effects on optical and structural properties of TiO₂ thin films deposited by ion beam sputtering

Yugang Jiang, Jiahuan He, Lishuan Wang, Shida Li, Dan Chen, Meiping Zhu, Huasong Liu

Proceedings Volume 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019); 110640H (2019) https://doi.org/10.1117/12.2539044
Event: Pacific Rim Laser Damage 2019 and Thin Film Physics and Applications 2019, 2019, Qingdao, China

Abstract

Titanium dioxide (TiO₂) thin films have been receiving much attention in the past as their chemical stability and high refractive index. In this paper, TiO₂ thin films were prepared on fused silica substrates by ion beam sputtering technique and then are annealed at different temperature. The effects of the annealing temperature on the optical and structural properties of TiO₂ thin films were studied. The results show that the refractive index, extinction coefficient of the TiO₂ thin film decrease with the increase of annealing temperature. When the annealing temperature is higher than 350°C, the surface of TiO₂ thin films shows an uneven mesh crack, which forms a significant film damage. The experimental results indicated that thermal treatment can effectively change the optical properties of the TiO₂ thin films.

Citation Download Citation

Yugang Jiang, Jiahuan He, Lishuan Wang, Shida Li, Dan Chen, Meiping Zhu, and Huasong Liu "Annealing effects on optical and structural properties of TiO₂ thin films deposited by ion beam sputtering", Proc. SPIE 11064, Tenth International Conference on Thin Film Physics and Applications (TFPA 2019), 110640H (8 July 2019); https://doi.org/10.1117/12.2539044

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KEYWORDS

Thin films

Titanium dioxide

Annealing

Refractive index

Sputter deposition

Ion beams

Transmittance

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