Characterization of a magnetron sputtering system for the development of broadband x-ray optic multilayer coatings

Danielle Gurgew; David M. Broadway; Brian Ramsey

doi:10.1117/12.2531713

9 September 2019 Characterization of a magnetron sputtering system for the development of broadband x-ray optic multilayer coatings

Danielle Gurgew, David M. Broadway, Brian Ramsey

Author Affiliations +

Proceedings Volume 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX; 111191M (2019) https://doi.org/10.1117/12.2531713
Event: SPIE Optical Engineering + Applications, 2019, San Diego, California, United States

Abstract

A direct current (DC) magnetron sputtering system has been developed at NASA Marshall Space Flight Center (MSFC) for depositing broadband X-ray optic multilayer coatings. The system has the capability to house up to four, 2-inch diameter direct-cooled DC magnetron cathodes. The relatively small dimensions of the cathodes facilitate low-cost, early stage research and development of various types of optical coatings while producing good coating uniformity across substrates that are twice the cathode diameter. Sources of non-repeatability in the deposition of depth-graded multilayer coatings were identified and compensated for, resulting in the ability to implement complex multilayer coating designs.

Citation Download Citation

Danielle Gurgew, David M. Broadway, and Brian Ramsey "Characterization of a magnetron sputtering system for the development of broadband x-ray optic multilayer coatings", Proc. SPIE 11119, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX, 111191M (9 September 2019); https://doi.org/10.1117/12.2531713

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