Paper
27 November 1989 X-Ray Laser Microscopy
S. Suckewer, D. DiCicco, D. Kim, L. Meixler, C. H. Nam, J. Robinson, C. H. Skinner, W. Tighe
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Abstract
This paper describes work at Princeton on X-ray laser microscopy. Related to this work is a new system for the development of an X-ray laser in the wavelength region from 5 nm to 1 nm utilizing a Powerful Sub-Picosecond Laser (PP-Laser) of expected peak power up to 0.5 TW in a 300 fs pulse. Soft X-ray spectra generated by the interaction of the PP-Laser beam with different targets are presented and compared to the spectra generated by a much less intense laser beam (20-30 GW). The development of additional amplifiers for the recombining soft X-ray laser and the design of a cavity are presented from the point of view of applications for X-ray microscopy and microlithography.
© (1989) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Suckewer, D. DiCicco, D. Kim, L. Meixler, C. H. Nam, J. Robinson, C. H. Skinner, and W. Tighe "X-Ray Laser Microscopy", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, (27 November 1989); https://doi.org/10.1117/12.961800
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KEYWORDS
Carbon dioxide lasers

Amplifiers

Ions

Optical amplifiers

X-ray lasers

Picosecond phenomena

Mirrors

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