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20 September 2020 Study on dependence of transient swelling layer formation on molecular weight and dispersion of backbone polymer of chemically amplified EUV resists
Takahiro Kozawa, Kyoko Watanabe, Kyoko Matsuoka, Naoki Tanaka, Kazuki Azumagawa, Takuya Ikeda, Yoshitaka Komuro, Daisuke Kawana
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Proceedings Volume 11517, Extreme Ultraviolet Lithography 2020; 115170G (2020) https://doi.org/10.1117/12.2574877
Event: SPIE Photomask Technology + EUV Lithography, 2020, Online Only
Abstract
In the development of highly resolving and highly sensitive resist materials, stochastic phenomena (LER and stochastic defect generation) are a critical issue. In this study, the dependence of the transient swelling layer formation of resist backbone polymer on its molecular weight and dispersion was investigated for the development of highly resolving resist materials. The dissolution kinetics was measured for different molecular weights and dispersions using quartz crystal microbalance (QCM) method. The relationship between transient swelling layer and stochastic defect formation is discussed.
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Takahiro Kozawa, Kyoko Watanabe, Kyoko Matsuoka, Naoki Tanaka, Kazuki Azumagawa, Takuya Ikeda, Yoshitaka Komuro, and Daisuke Kawana "Study on dependence of transient swelling layer formation on molecular weight and dispersion of backbone polymer of chemically amplified EUV resists", Proc. SPIE 11517, Extreme Ultraviolet Lithography 2020, 115170G (20 September 2020); https://doi.org/10.1117/12.2574877
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KEYWORDS
Polymers
Stochastic processes
Dispersion
Extreme ultraviolet
Line edge roughness
Molecules
Bridges
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