Paper
4 December 2020 A new method to calibrate an atomic force microscope with the self-traceable chromium grating fabricated by atomic lithography
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Proceedings Volume 11617, International Conference on Optoelectronic and Microelectronic Technology and Application; 1161736 (2020) https://doi.org/10.1117/12.2585428
Event: International Conference on Optoelectronic and Microelectronic Technology and Application, 2020, Nanjing, China
Abstract
The error calibration of the nonlinearity of atomic force microscope (AFM) is the critical step to assure the accuracy during the measurement of microscale structure. In this paper, a new method to calibrate the atomic force microscope is proposed, which is based on the one dimensional self-traceable Chromium nanometre length reference material fabricated by the technique of atomic lithography. The pattern of the Cr grating measured by the metrological AFM present that the pitch is 212.8 nm and the accuracy of the pitch is better than 0.1nm. The number of its pitch is obtained by the centroid method on the data of the grating pattern. The nonlinearity of the commercial AFM is calibrated in the way of measuring the mean pitch of the Cr grating under the several different micron scale. This work offers a flexible solution for calibrating the AFM and meet the calibration need in the activity of nanometre fabrication
© (2020) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhenjie Gu, Xiao Deng, Yanni Cai, Xinpan Wang, and Feng Yang "A new method to calibrate an atomic force microscope with the self-traceable chromium grating fabricated by atomic lithography", Proc. SPIE 11617, International Conference on Optoelectronic and Microelectronic Technology and Application, 1161736 (4 December 2020); https://doi.org/10.1117/12.2585428
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