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5 March 2021 Sensitive multi-photon photoresists: Overview and recent advances
Pascal Kiefer, Vincent Hahn, Martina Nardi, Liang Yang, Eva Blasco, Christopher Barner-Kowollik, Martin Wegener
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Proceedings Volume 11677, Laser 3D Manufacturing VIII; 116770J (2021) https://doi.org/10.1117/12.2576304
Event: SPIE LASE, 2021, Online Only
Abstract
Recently, the necessary average total laser power for rapid multi-photon multi-focus applications has exceeded the Watt level. To enable even faster 3D printing, we have developed new sensitive photoresists by adding co-initiators to commonly used standard systems. We yet exceed these advances in sensitivity using a novel photoresist system based on a modified benzylidene ketone photoinitiator, making it a very attractive system for advanced rapid 3D laser nanoprinting. To compare our original results to more than 70 different published systems from the literature, we define a photoresist-sensitivity figure-of-merit, enabling a fair comparison to measurements taken under vastly different conditions.
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Pascal Kiefer, Vincent Hahn, Martina Nardi, Liang Yang, Eva Blasco, Christopher Barner-Kowollik, and Martin Wegener "Sensitive multi-photon photoresists: Overview and recent advances", Proc. SPIE 11677, Laser 3D Manufacturing VIII, 116770J (5 March 2021); https://doi.org/10.1117/12.2576304
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KEYWORDS
Photoresist materials
Polymers
Laser damage threshold
Laser development
Laser systems engineering
Liquids
Materials science
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