X-ray interferometry technique for thin-films study using an x-ray microfocus laboratory source

M. Voevodina; S. Lyatun; D. Zverev; A. Barannikov; I. Lyatun; I. Snigireva; A. Snigirev

doi:10.1117/12.2589495

18 April 2021 X-ray interferometry technique for thin-films study using an x-ray microfocus laboratory source

M. Voevodina, S. Lyatun, D. Zverev, A. Barannikov, I. Lyatun, I. Snigireva, A. Snigirev

Proceedings Volume 11776, EUV and X-ray Optics, Sources, and Instrumentation; 1177609 (2021) https://doi.org/10.1117/12.2589495
Event: SPIE Optics + Optoelectronics, 2021, Online Only

Abstract

We are proposing an X-ray reflecto-interferometry technique using an x-ray microfocus laboratory source for thin-film structure research based on compound refractive lenses. The idea of this technique is to use a very simplified experimental setup where a focused X-ray beam reflected from parallel flat surfaces creates an interference pattern in a wide angular range. Due to this, the interference pattern can be obtained in a single shot without the need to rotate the specimen or the detector. The applicability of this technique has been demonstrated using the MetalJet Excillium microfocus laboratory source, which has GaKα emission line at 9.25 keV. A series of interference patterns for Si₃N₄ membranes and the experimentally obtained film thickness are in good agreement with the declared characteristics. The main advantages and future possible of the reflecto-interferometry technique are discussed.

Citation Download Citation

M. Voevodina, S. Lyatun, D. Zverev, A. Barannikov, I. Lyatun, I. Snigireva, and A. Snigirev "X-ray interferometry technique for thin-films study using an x-ray microfocus laboratory source", Proc. SPIE 11776, EUV and X-ray Optics, Sources, and Instrumentation, 1177609 (18 April 2021); https://doi.org/10.1117/12.2589495

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