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This paper presents the use of TiO2 as a strip loaded waveguide on thin-film lithium niobate (TFLN). The waveguides were fabricated by using an RF reactive sputtering deposition followed by a dielectric lift-off process. An additional layer of SiO2 was deposited as a cladding layer using a plasma-enhanced chemical vapor deposition (PECVD). To characterize this process, atomic-force-microscopy (AFM) and an ellipsometer were used. Lastly, a propagation loss of 1.26dB/cm at 1550nm was experimentally measured by Optical Backscatter reflectometry (OBR) and are presented in this paper.
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Xiaofeng Zhu, Andrew J. Mercante, Shouyuan Shi, Yao Peng, Dennis W. Prather, "Low loss titanium dioxide strip loaded waveguide on thin-film lithium niobate at 1550nm," Proc. SPIE 11997, Optical Components and Materials XIX, 1199705 (4 March 2022); https://doi.org/10.1117/12.2614601