Nano-imprint-lithography for very thin optical parts on large area

Janine Brommert; Markus Rawert; Thomas Ruhl

doi:10.1117/12.2647826

17 March 2023 Nano-imprint-lithography for very thin optical parts on large area

Janine Brommert, Markus Rawert, Thomas Ruhl

Author Affiliations +

Proceedings Volume 12434, MOEMS and Miniaturized Systems XXII; 1243403 (2023) https://doi.org/10.1117/12.2647826
Event: SPIE OPTO, 2023, San Francisco, California, United States

Abstract

Due to higher integration of optical functionality into compact products like augmented reality into Head-Up-Displays (HUD), there is an increasing demand for very thin and large micro-optical films. Classical production techniques like injection molding are not able to deliver the requested quality or part dimensions. Nano-Imprint-Lithography (NIL) can close this gap and provide very thin and at the same time very large micro-optical products. We will show the general approach and examples for different markets with all necessary steps (origination, tooling and NIL-replication) on substrates from 6” x 6” up to max. size of Gen5-Display-Size (1100 x 1300 mm²).

Conference Presentation

Citation Download Citation

Janine Brommert, Markus Rawert, and Thomas Ruhl "Nano-imprint-lithography for very thin optical parts on large area", Proc. SPIE 12434, MOEMS and Miniaturized Systems XXII, 1243403 (17 March 2023); https://doi.org/10.1117/12.2647826

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