Effect of central obscuration on image formation in projection lithography

Steven T. Yang; Robert L. Hsieh; Y.-H. Lee; Roger Fabian W. Pease; Gerry Owen

doi:10.1117/12.20203

1 June 1990 Effect of central obscuration on image formation in projection lithography

Steven T. Yang, Robert L. Hsieh, Y.-H. Lee, Roger Fabian W. Pease, Gerry Owen

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20203
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

Central obscuration of the pupil is a prominent feature of many high performance reflective designs being considered for sub-200nm lithography. The performance of centrally-obscured designs were investigated using computer simulations of projected image intensity and major features from simulation were experimentally confirmed. The effect of partially-coherent illumination on centrally-obscured systems was studied and an optimized annular illumination system is proposed. 1.

Citation Download Citation

Steven T. Yang, Robert L. Hsieh, Y.-H. Lee, Roger Fabian W. Pease, and Gerry Owen "Effect of central obscuration on image formation in projection lithography", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20203

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