A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation

Stewart Robertson; Robert Schramm; Alessandro Vaglio Pret; Vincent Wiaux

doi:10.1117/12.2688230

21 November 2023 A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation

Stewart Robertson, Robert Schramm, Alessandro Vaglio Pret, Vincent Wiaux

Proceedings Volume 12750, International Conference on Extreme Ultraviolet Lithography 2023; 1275003 (2023) https://doi.org/10.1117/12.2688230
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States

Abstract

Anamorphic magnification in high NA EUV will reduce the maximum wafer area of a single lithographic exposure field in half compared to current exposure equipment. Large die exceeding this area will require the use of two separate masks which must be stitched together. There is a preference within the industry to stich the fields together “at resolution” using features of the same dimension and pitch as those elsewhere in the design. Stochastic lithography simulation is used to model the effects of field stitching on patterning performance with regards to the defectivity process window as a function of X and Y registration. It is observed that the best defectivity performance conditions may vary significantly from those that produce the optimum CD uniformity.

Conference Presentation

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Stewart Robertson, Robert Schramm, Alessandro Vaglio Pret, and Vincent Wiaux "A study of high NA EUV pattern stitching using rigorous stochastic lithography simulation", Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 1275003 (21 November 2023); https://doi.org/10.1117/12.2688230

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available