Presentation + Paper
21 November 2023 Factors driving merchant photomask growth and shortages
Les Dahl, Bud Caverly
Author Affiliations +
Abstract
Merchant photomask companies service the majority of the 14nm and greater nodes globally. These industry important nodes are facing mask supply challenges in the coming decade due to new organic growth and tool obsolescence. The first factor driving photomask volume is the significant wafer capacity being added globally at mid and mature technologies (>=28nm). The semiconductor growth is being driven by macro market trends including a renewed global appreciation of the strategic nature of the semiconductor business. The growth also is the result of new technology innovations like automotive electrification & ADAS, Artificial Intelligence, telecom (5G/6G), IoT, green power, and medical applications. The overall semiconductor business is forecasted to grow upwards of 8% CAGR from 2022 – 2030 1 with a significant portion occurring in Mid and Mature Technologies. This growth will require significant non-leading edge mask capacity. This paper will quantify the growth and the availability of tooling. Historically, photomask equipment makers produced new tools for the “leading edge” and the trailing nodes were serviced by previous generations of advanced photomasks tools. Fortunately, the photomask equipment manufacturers responded to the trailing edge needs and have introduced tools and upgrades to begin addressing this market. The second issue facing the photomask industry is significant equipment obsolescence for the mask tools that support mature technologies. This paper quantifies the obsolescence challenge. The dual factors of new organic growth and tool retirements has created a shortage of mask supply at the mid and mature nodes. There are challenges to add mask capacity to these mature nodes in an economically viable fashion. We believe that cooperation between mask maker, tool suppliers and mask customers is crucial to ensure that the predicted semiconductor growth does not face the risk of being constrained by photomasks.
Conference Presentation
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Les Dahl and Bud Caverly "Factors driving merchant photomask growth and shortages", Proc. SPIE 12751, Photomask Technology 2023, 127510H (21 November 2023); https://doi.org/10.1117/12.2688593
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Photomasks

Industry

Semiconductors

Semiconducting wafers

Design and modelling

Manufacturing

Logic

RELATED CONTENT

A pattern-based method to automate mask inspection files
Proceedings of SPIE (March 28 2017)
History and future of mask making
Proceedings of SPIE (December 27 1996)
Cost of mask fabrication
Proceedings of SPIE (July 07 1997)
Photomask film degradation effects in the wafer fab how...
Proceedings of SPIE (November 08 2012)
Evolution of the photomask industry
Proceedings of SPIE (January 01 1992)

Back to Top