Preliminary evaluation of the KLA/Micrion 808 one step clear and opaque defect repair system

James A. Reynolds

doi:10.1117/12.3011888

12 October 2023 Preliminary evaluation of the KLA/Micrion 808 one step clear and opaque defect repair system

James A. Reynolds

Proceedings Volume 12809, Bay Area Chrome Users Society Symposium 1985; 1280905 (2023) https://doi.org/10.1117/12.3011888
Event: 5th Annual BACUS Symposium, 1985, Sunnyvale, CA, United States

Abstract

The advent of wafer steppers has given rise to the need for defect-free masks. This requirement presents different problems to the manufacturers of the different types of masks which are used in modern lithography tools. 5X reticles can contain field areas up to 100 square cm which must be free of any defects larger than 1.5 microns. In the case of IX reticles, several areas as large as 1 sq cm must have all defects larger than .5 micron removed. In these two cases, the presence of a single unrepairable clear or opaque defect can cause the rejection of a mask worth several thousand dollars. The ability to make a truly defect free IX full field projection mask would be of great value to the mask user and the mask maker.

Citation Download Citation

James A. Reynolds "Preliminary evaluation of the KLA/Micrion 808 one step clear and opaque defect repair system", Proc. SPIE 12809, Bay Area Chrome Users Society Symposium 1985, 1280905 (12 October 2023); https://doi.org/10.1117/12.3011888

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