Accelerated equipment design through a next generation damping and lifetime simulation capabilities

Alan Astbury; Martin Wolf; Christoph Wehmann; Ambarish Kulkarni; Murat Gulcur

doi:10.1117/12.3009958

10 April 2024 Accelerated equipment design through a next generation damping and lifetime simulation capabilities

Alan Astbury, Martin Wolf, Christoph Wehmann, Ambarish Kulkarni, Murat Gulcur

Proceedings Volume 12953, Optical and EUV Nanolithography XXXVII; 129530Z (2024) https://doi.org/10.1117/12.3009958
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

In state-of-the-art lithography equipment, isolating vibrations and maintaining vacuum integrity at the highest level is crucial while minimizing outgassing and contamination. This is essential for optimizing tool performance. Due to their viscoelastic properties, elastomers, primarily perfluoroelastomers or FFKMs, are commonly employed in sealing and damping applications in high-end semiconductor equipment. This work introduces two advanced simulation modeling techniques. The first technique predicts the lifetime of elastomer seals based on the elastomers' compression set, including temperature effects. The second technique simulates the damping properties of elastomers to optimize damper design. Predicting the lifetime of sealing systems can help determine the optimum maintenance periods and increase profitability in costly wafer processing. Predicting the damping behavior of elastomers can help accelerate the equipment design and development process at semiconductor OEMs.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Alan Astbury, Martin Wolf, Christoph Wehmann, Ambarish Kulkarni, and Murat Gulcur "Accelerated equipment design through a next generation damping and lifetime simulation capabilities ", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 129530Z (10 April 2024); https://doi.org/10.1117/12.3009958

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