Advanced patterning strategies for maskless laser direct write lithography

Matthias Wahl; Jeff Michelmann; Holger Sailer; Angela Schneider; Nicolas Dionisio

doi:10.1117/12.3010803

9 April 2024 Advanced patterning strategies for maskless laser direct write lithography

Matthias Wahl, Jeff Michelmann, Holger Sailer, Angela Schneider, Nicolas Dionisio

Proceedings Volume 12956, Novel Patterning Technologies 2024; 129560A (2024) https://doi.org/10.1117/12.3010803
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

Laser direct write lithography using near-i-line wavelength is a very fast, versatile, and cost-effective maskless technique for fabricating microstructures, especially for prototyping and low-volume production in many fields of application, e.g. microelectronics, photonics, optical devices, and mastering. However, the resolution of this method is limited and depends on the focal length of the write lens used, which means that it is necessary to find a tradeoff between write speed and resolution. In this paper, we will optimize the resolution of i-line direct write processes by applying resolution enhancement techniques, which are well known in stepper lithography. IMS Chips and Heidelberg Instruments collaborated on tuning both process and tool performance with the goal to improve structure density and resolution.

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Matthias Wahl, Jeff Michelmann, Holger Sailer, Angela Schneider, and Nicolas Dionisio "Advanced patterning strategies for maskless laser direct write lithography", Proc. SPIE 12956, Novel Patterning Technologies 2024, 129560A (9 April 2024); https://doi.org/10.1117/12.3010803

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KEYWORDS

Direct write lithography

Equipment

Advanced patterning

Lithography

Image quality

Semiconducting wafers

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