Analysis of laser-induced contamination in the sub-picosecond UV regime and its consequences on laser beam quality in the context of industrial applications

Jules Herbuvaux; Frank Wagner; Luis A. Vazquez-Zuniga; Serge Monneret; Clemens Hoenninger; Julien Nillon; Laurent Gallais

doi:10.1117/12.3032734

17 December 2024 Analysis of laser-induced contamination in the sub-picosecond UV regime and its consequences on laser beam quality in the context of industrial applications

Jules Herbuvaux, Frank Wagner, Luis A. Vazquez-Zuniga, Serge Monneret, Clemens Hoenninger, Julien Nillon, Laurent Gallais

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Proceedings Volume 13190, Laser-Induced Damage in Optical Materials 2024; 131900R (2024) https://doi.org/10.1117/12.3032734
Event: SPIE Laser Damage, 2024, San Ramon, CA, United States

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Abstract

The study investigates Laser-Induced Contamination (LIC) effects on beam quality, focusing on sub-picosecond UV lasers, crucial in industrial applications. By analyzing LIC at 343 nm, 480 fs and 30 W, the research aims to understand its impact on beam parameters like M² factor. A simulation and experimental setup are employed to study LIC dynamics and its consequences on beam propagation. Through theoretical simulations and practical observations, the study seeks provide insights into LIC’s influence on laser beam quality.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Jules Herbuvaux, Frank Wagner, Luis A. Vazquez-Zuniga, Serge Monneret, Clemens Hoenninger, Julien Nillon, and Laurent Gallais "Analysis of laser-induced contamination in the sub-picosecond UV regime and its consequences on laser beam quality in the context of industrial applications", Proc. SPIE 13190, Laser-Induced Damage in Optical Materials 2024, 131900R (17 December 2024); https://doi.org/10.1117/12.3032734

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