Testing plan of NA 0.8 deep UV objective system for  semiconductor defect inspection

Yunjong Kim; Jihun Kim; JaeHee Byun; HanRim Chae; KyoungSang Moon; Minkyu Jung; Wonbin Choi; Ingu Chang; Hyun-il Cho

doi:10.1117/12.3037799

20 November 2024 Testing plan of NA 0.8 deep UV objective system for semiconductor defect inspection

Yunjong Kim, Jihun Kim, JaeHee Byun, HanRim Chae, KyoungSang Moon, Minkyu Jung, Wonbin Choi, Ingu Chang, Hyun-il Cho

Proceedings Volume 13216, Photomask Technology 2024; 132162C (2024) https://doi.org/10.1117/12.3037799
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

We are developing an objective system for a catadioptric setup used in semiconductor defect inspection at 193nm in deep UV band. This system comprises seven lenses and two mirrors with a numerical aperture of 0.8 and a total length of 95mm. Upon analyzing the optical performance of the system, we identified two lenses as the most sensitive components. These lenses will serve as compensators during the assembly and alignment process using an interferometer. In this paper, we present the testing plan for the catadioptric system and discuss the assembly process.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

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Yunjong Kim, Jihun Kim, JaeHee Byun, HanRim Chae, KyoungSang Moon, Minkyu Jung, Wonbin Choi, Ingu Chang, and Hyun-il Cho "Testing plan of NA 0.8 deep UV objective system for semiconductor defect inspection", Proc. SPIE 13216, Photomask Technology 2024, 132162C (20 November 2024); https://doi.org/10.1117/12.3037799

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