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1 March 1991 Large-scale industrial application for excimer lasers: via-hole-drilling by photoablation
Friedrich G. Bachmann
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Proceedings Volume 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization; (1991) https://doi.org/10.1117/12.24385
Event: Physical Concepts of Materials for Novel Optoelectronic Device Applications, 1990, Aachen, Germany
Abstract
Numerous potential excimer laser processing applications have recently been reported in the literature but examples of large scale excimer laser use in an industrial environment are very rare. In this article we inform about the different techniques and also about one of the first processes in which excimer lasers are used in a production line: Via-holes with aspect ratios close to one used in a printed circuit board of a high density multi-chip module are generated by ablation of the dielectric layer in an extremely reliable and reproducible way. The important processing parameters will be discussed.
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Friedrich G. Bachmann "Large-scale industrial application for excimer lasers: via-hole-drilling by photoablation", Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); https://doi.org/10.1117/12.24385
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KEYWORDS
Excimer lasers
Dielectrics
Laser ablation
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