Pulsed-laser deposition of YBa2Cu3O7-x thin films: processing, properties, and performance

Ross E. Muenchausen; Stephen R. Foltyn; Xin Di Wu; Robert C. Dye; Nicholas S. Nogar; A. H. Carim; F. Heidelbach; D. Wayne Cooke; Robert C. Taber; Rod K. Quinn

doi:10.1117/12.25751

1 March 1991 Pulsed-laser deposition of YBa₂Cu₃O_7-x thin films: processing, properties, and performance

Ross E. Muenchausen, Stephen R. Foltyn, Xin Di Wu, Robert C. Dye, Nicholas S. Nogar, A. H. Carim, F. Heidelbach, D. Wayne Cooke, Robert C. Taber, Rod K. Quinn

Author Affiliations +

Proceedings Volume 1394, Progress In High-Temperature Superconducting Transistors and Other Devices; (1991) https://doi.org/10.1117/12.25751
Event: Processing Integration, 1990, Santa Clara, CA, United States

Abstract

One and two inch diameter wafers of (100) LaAlO3 have been coated with thin films of YBa2Cu3O7_ by a pulsed laser deposition technique. Deposition parameters have been optimized to produce uniform, 90 K films which have surface resistance values between 0.4 and 0.8 mμ at 4 K and 22 GHz.

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Ross E. Muenchausen, Stephen R. Foltyn, Xin Di Wu, Robert C. Dye, Nicholas S. Nogar, A. H. Carim, F. Heidelbach, D. Wayne Cooke, Robert C. Taber, and Rod K. Quinn "Pulsed-laser deposition of YBa₂Cu₃O_7-x thin films: processing, properties, and performance", Proc. SPIE 1394, Progress In High-Temperature Superconducting Transistors and Other Devices, (1 March 1991); https://doi.org/10.1117/12.25751

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