Etch conditions of photolithographic holograms

Yongkang Guo; Lurong Guo; Xiao-Chun Zhang

doi:10.1117/12.44717

1 July 1991 Etch conditions of photolithographic holograms

Yongkang Guo, Lurong Guo, Xiao-Chun Zhang

Proceedings Volume 1461, Practical Holography V; (1991) https://doi.org/10.1117/12.44717
Event: Electronic Imaging '91, 1991, San Jose, CA, United States

Abstract

The authors have, on combining holography with photolithography, improved the etching conditions of making binary elements and produced photolithographic holograms which can yield continuous phase modulation. This paper points out that it is most important to strictly control the selection ratio of etching rates, and gives the curves of the etching rates in respect to the flow of etching gas in the case of constant response power. A proper working point has been found. As the applications of the curves, high-quality optical elements can be made.

Citation Download Citation

Yongkang Guo, Lurong Guo, and Xiao-Chun Zhang "Etch conditions of photolithographic holograms", Proc. SPIE 1461, Practical Holography V, (1 July 1991); https://doi.org/10.1117/12.44717

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