Ablation of ITO and TO films from glass substrates

Frode Meringdal; Harald Slinde

doi:10.1117/12.46941

1 September 1991 Ablation of ITO and TO films from glass substrates

Frode Meringdal, Harald Slinde

Proceedings Volume 1503, Excimer Lasers and Applications III; (1991) https://doi.org/10.1117/12.46941
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands

Abstract

The possibility of using a KrF excimer laser to remove indium-tin-oxide (ITO) and tin-oxide (TO) films from glass substrates is investigated. Etching with the excimer laser is compared with etching with a CO2 laser and a Nd:YAG laser. Patterns of removed film are made on the glass substrates using a mask imaging technique. The removal of the ITO and the TO is considered to be complete when the resistance across the removed tracks is greater than 20 M(Omega) . The length of the track is 1 cm and the width is 25 micrometers . Different substrates are tested. The fluence is varied. The results are characterized using a scanning electron microscope, by resistance measurements and by ablation depth measurements. The results are discussed.

Citation Download Citation

Frode Meringdal and Harald Slinde "Ablation of ITO and TO films from glass substrates", Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991); https://doi.org/10.1117/12.46941

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