Excimer laser deposition and characterization of tin and tin-oxide films

E. Borsella; P. De Padova; Rosanna Larciprete

doi:10.1117/12.46943

1 September 1991 Excimer laser deposition and characterization of tin and tin-oxide films

E. Borsella, P. De Padova, Rosanna Larciprete

Proceedings Volume 1503, Excimer Lasers and Applications III; (1991) https://doi.org/10.1117/12.46943
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands

Abstract

ArF excimer laser deposition of tin and tin-oxide films on Si was obtained dissociating tetramethyltin Sn(CH3)4(TMT) and TMT/N2O mixtures. Information on the gas phase photoproducts was achieved by spontaneous emission spectroscopy. Electronically excited CH and Sn fragments were detected and their formation and decay mechanisms investigated through spectral and temporal analysis of the fluorescence signal. The effect of buffer gases on the emission characteristics was also studied.

Citation Download Citation

E. Borsella, P. De Padova, and Rosanna Larciprete "Excimer laser deposition and characterization of tin and tin-oxide films", Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991); https://doi.org/10.1117/12.46943

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