Thin-film selective multishot ablation at 248 nm

Hans Eckard Hunger; H. Pietsch; Stefan Petzoldt; Eckart Matthias

doi:10.1117/12.51022

1 December 1991 Thin-film selective multishot ablation at 248 nm

Hans Eckard Hunger, H. Pietsch, Stefan Petzoldt, Eckart Matthias

Proceedings Volume 1598, Lasers in Microelectronic Manufacturing; (1991) https://doi.org/10.1117/12.51022
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States

Abstract

Excimer laser ablation of multi-layered films was studied using the photoacoustic mirage effect technique. Layered systems of a polymer-metal-SiO2 type was investigated for various metals between 0.5 and 2 J/cm2. Significant changes in the deflection signal were found when the ablation passed the interface between subsequent layers. This effect can be used to distinguish between different materials and is therefore suited for an in situ control of pulsed laser processing.

Citation Download Citation

Hans Eckard Hunger, H. Pietsch, Stefan Petzoldt, and Eckart Matthias "Thin-film selective multishot ablation at 248 nm", Proc. SPIE 1598, Lasers in Microelectronic Manufacturing, (1 December 1991); https://doi.org/10.1117/12.51022

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