High-Precision Polishing With Polytron

H. J. Juranek

doi:10.1117/12.956909

25 September 1979 High-Precision Polishing With Polytron

H. J. Juranek

Proceedings Volume 0163, Advances in Optical Production Technology II; (1979) https://doi.org/10.1117/12.956909
Event: Advances in Optical Production Technology, 1979, London, United Kingdom

Abstract

A special polishing pad is described which is very little known up to now. It was developed by CARL ZEISS some years ago it was named Polytron. General concept of Polytronpolishing is discussed and special examples of workshopapplications are given.

Citation Download Citation

H. J. Juranek "High-Precision Polishing With Polytron", Proc. SPIE 0163, Advances in Optical Production Technology II, (25 September 1979); https://doi.org/10.1117/12.956909

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