Dynamics of S production in the 193-nm photodissociation of CH3SCH3, CH3SSCH3, CH3SH, and H2S

Chung-Lin Liao; C.-W. Hsu; Cheuk Yiu Ng

doi:10.1117/12.58141

1 April 1992 Dynamics of S production in the 193-nm photodissociation of CH₃SCH₃, CH₃SSCH₃, CH₃SH, and H₂S

Chung-Lin Liao, C.-W. Hsu, Cheuk Yiu Ng

Proceedings Volume 1638, Optical Methods for Time- and State-Resolved Chemistry; (1992) https://doi.org/10.1117/12.58141
Event: OE/LASE '92, 1992, Los Angeles, CA, United States

Abstract

The production of S(³P, ¹D, ¹S) in the 193 nm photodissociation of CH₃SCH₃, CH₃SSCH₃, CH₃SH, and H₂S has been studied using 2 + 1 REMPI techniques. The 193 nm photodissociation cross sections of the radicals CH₃S and HS initially formed in the photodissociation of CH₃SCH₃, CH₃SSCH₃, CH₃SH, and H₂S have been determined as 1 X 10^-18 cm² using a rate equation scheme. The dominant product from CH₃S is S(¹D), while that from SH is S(³P). The formation of S(³P) in the 1-photon (193 nm) photodissociation of CH₃SSCH₃ is also observed.

Citation Download Citation

Chung-Lin Liao, C.-W. Hsu, and Cheuk Yiu Ng "Dynamics of S production in the 193-nm photodissociation of CH₃SCH₃, CH₃SSCH₃, CH₃SH, and H₂S", Proc. SPIE 1638, Optical Methods for Time- and State-Resolved Chemistry, (1 April 1992); https://doi.org/10.1117/12.58141

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