Quarter-micron KrF excimer laser lithography with a chemically amplifying negative resist

Akira Oikawa; Shuichi Miyata; Kimihisa Maeda; Hiroyuki Tanaka; Kenji Nakagawa

doi:10.1117/12.59756

1 June 1992 Quarter-micron KrF excimer laser lithography with a chemically amplifying negative resist

Akira Oikawa, Shuichi Miyata, Kimihisa Maeda, Hiroyuki Tanaka, Kenji Nakagawa

Proceedings Volume 1672, Advances in Resist Technology and Processing IX; (1992) https://doi.org/10.1117/12.59756
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

We have developed X123, a chemically amplifying negative resist, for KrF excimer-laser lithography. X123 mainly consists of a highly transparent polyvinylphenol derivative, purified hexamethoxymethylmelamine, and a photo acid generator. Resist performance was improved by refinement of chemicals, a quantitative study of the components, and a study of processing conditions. The resolution of X123 is 0.25 micrometers under optimized processing conditions without phase shift masks. Its depth-of-focus is 1.0 micrometers for 0.30 micrometers line-and-space (L&S) patterns and 1.5 micrometers for 0.35 micrometers L&S patterns. Other process latitudes are also wide. X123 shows promise for future device fabrication.

Citation Download Citation

Akira Oikawa, Shuichi Miyata, Kimihisa Maeda, Hiroyuki Tanaka, and Kenji Nakagawa "Quarter-micron KrF excimer laser lithography with a chemically amplifying negative resist", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59756

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