Paper
4 May 1993 High average power XeCl excimer laser
Bernard Lacour, Henri Brunet, Herve Besaucele, Claude Gagnol
Author Affiliations +
Proceedings Volume 1810, 9th International Symposium on Gas Flow and Chemical Lasers; (1993) https://doi.org/10.1117/12.144666
Event: Ninth International Symposium on Gas Flow and Chemical Lasers, 1992, Heraklion, Greece
Abstract
We have developed a high repetition rate, high average power excimer laser intended for industrial applications. The system operates in the phototriggered mode and is capable of continuous operation at repetition rates up to 700 Hz. A compact closed loop gas recirculation system, driven by two centrifugal blowers is employed, providing gas flow velocities up to 35 m/s. The laser delivers a maximum average output power of more than 500 W at 308 nm wavelength.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bernard Lacour, Henri Brunet, Herve Besaucele, and Claude Gagnol "High average power XeCl excimer laser", Proc. SPIE 1810, 9th International Symposium on Gas Flow and Chemical Lasers, (4 May 1993); https://doi.org/10.1117/12.144666
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Excimer lasers

Pulsed laser operation

Capacitors

Laser development

Reliability

Chemical lasers

Energy efficiency

RELATED CONTENT

TEA HF laser with a high specific radiation energy
Proceedings of SPIE (January 13 2017)
Improvement of the ArF laser for photolithography
Proceedings of SPIE (May 26 1995)
Excimer Laser Technology
Proceedings of SPIE (October 31 1980)
Compact excimer laser system
Proceedings of SPIE (May 04 1993)
Excimer laser technology for soft x-ray generation
Proceedings of SPIE (June 01 1994)

Back to Top