Achieving superior MEBES performance through the use of SPC programs and state-of-the-art facilities

Linda A. Braz

doi:10.1117/12.146528

24 June 1993 Achieving superior MEBES performance through the use of SPC programs and state-of-the-art facilities

Linda A. Braz

Proceedings Volume 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III; (1993) https://doi.org/10.1117/12.146528
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

A MEBES III system can perform at levels that far exceed those published by the manufacturer. To achieve this, the photomask facility must be capable of maintaining extremely tight temperature controls. In addition, noise free power must be utilized and Class 10 cleanliness maintained. Through the use of a statistical process control (SPC) program generated at Etec, the MEBES performance can be monitored. Anomalies in system performance can be immediately identified and corrected without losing production masks. Impending system problems such as needed gun changes, gun centering, aperture changes, and charging of plates can be recognized and corrected before MEBES system performance would exceed our specifications. This paper also describes some of the unique facility designs/controls and demonstrated, through results, how these contribute to the MEBES performance.

Citation Download Citation

Linda A. Braz "Achieving superior MEBES performance through the use of SPC programs and state-of-the-art facilities", Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); https://doi.org/10.1117/12.146528

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