Characteristics of the spherical pinch plasma radiation source (SPX II) for x-ray, UV, and deep-UV lithography

Shridar Aithal; Emilio Panarella; M. Lamari; B. Hilko; Robert B. McIntosh

doi:10.1117/12.146519

24 June 1993 Characteristics of the spherical pinch plasma radiation source (SPX II) for x-ray, UV, and deep-UV lithography

Shridar Aithal, Emilio Panarella, M. Lamari, B. Hilko, Robert B. McIntosh

Author Affiliations +

Proceedings Volume 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III; (1993) https://doi.org/10.1117/12.146519
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

The concept of generating soft X-rays using a Spherical Pinch source was presented at the 1991 and 1992 SPIE conferences. In this paper we present the electrical specifications, plasma and radiation characteristics, system operation and maintenance for the SPX II prototype machine. In addition, we present the X-ray output power levels and times of exposure to attain a given dose level for different input electrical energies of the machine. Finally, we provide a status report on the construction of a new upscale version (SPX III) of the Spherical Pinch X- ray source which is being built as an industrial prototype for application in X-ray microlithography.

Citation Download Citation

Shridar Aithal, Emilio Panarella, M. Lamari, B. Hilko, and Robert B. McIntosh "Characteristics of the spherical pinch plasma radiation source (SPX II) for x-ray, UV, and deep-UV lithography", Proc. SPIE 1924, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III, (24 June 1993); https://doi.org/10.1117/12.146519

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