Off-axis illumination--working principles and comparison with alternating phase-shifting masks

Burn Jeng Lin

doi:10.1117/12.150417

8 August 1993 Off-axis illumination--working principles and comparison with alternating phase-shifting masks

Burn Jeng Lin

Proceedings Volume 1927, Optical/Laser Microlithography; (1993) https://doi.org/10.1117/12.150417
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

The working principles of off-axis illumination to improve the resolution and depth of focus of optical projection imaging and some foreseeable problems are explained in pictorial and analytical forms in terms of coherent illumination systems. Partial coherent illuminations are used to compare the imaging performance of off-axis illumination systems in the form of quadrapole and ring with the alternating phase-shifting mask technique. Other aspects between these two enhancement techniques are also compared. Some unexpected conclusions have been drawn.

Citation Download Citation

Burn Jeng Lin "Off-axis illumination--working principles and comparison with alternating phase-shifting masks", Proc. SPIE 1927, Optical/Laser Microlithography, (8 August 1993); https://doi.org/10.1117/12.150417

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