Refractive microlens arrays fabricated by reactive ion etching

Margaret B. Stern; Theresa Rubico Jay

doi:10.1117/12.165699

15 December 1993 Dry etching: path to coherent refractive microlens arrays

Margaret B. Stern, Theresa Rubico Jay

Proceedings Volume 1992, Miniature and Micro-Optics and Micromechanics; (1993) https://doi.org/10.1117/12.165699
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

Reactive ion etching (RIE) is used to fabricate infrared refractive micro-optics in silicon. Three methods are used: binary optics technology which uses iterative steps of photolithography and RIE to create a multistep approximation to an aspheric profile; direct etching of a preshaped polymer microlens etch mask into the substrate; and analog etching of a lens profile directly into the substrate through a pinhole mask.

Citation Download Citation

Margaret B. Stern and Theresa Rubico Jay "Dry etching: path to coherent refractive microlens arrays", Proc. SPIE 1992, Miniature and Micro-Optics and Micromechanics, (15 December 1993); https://doi.org/10.1117/12.165699

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