Paper
22 October 1993 Nitrogenation of amorphous carbon layers as a method for improving their performance as a spectrally selective absorber coating
Olaf Stenzel, Ralf Petrich, Till Wallendorf, Martina Vogel, Michael Moehl
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Abstract
Nitrogen-containing amorphous hydrogenated carbon layers have been deposited on silicon and aluminum by a dc plasma technique. The optical constants of the layers (refractive index and absorption coefficient), their solar absorptance and the thermal emittance at 373 K have been determined from spectrophotometric measurements. It is demonstrated that the solar absorptance of nitrogenated layers is higher than that of corresponding pure amorphous hydrogenated carbon layers, while the emittance values are comparable.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Olaf Stenzel, Ralf Petrich, Till Wallendorf, Martina Vogel, and Michael Moehl "Nitrogenation of amorphous carbon layers as a method for improving their performance as a spectrally selective absorber coating", Proc. SPIE 2017, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XII, (22 October 1993); https://doi.org/10.1117/12.161976
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Cited by 2 scholarly publications.
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KEYWORDS
Refractive index

Absorption

Carbon

Reflectivity

Nitrogen

Coating

Plasma

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