Laser conditioning of optical coatings: some issues in the characterization by atomic force microscopy

Anne Fornier; C. Cordillot; Dominique Ausserre; F. Paris

doi:10.1117/12.180922

28 July 1994 Laser conditioning of optical coatings: some issues in the characterization by atomic force microscopy

Anne Fornier, C. Cordillot, Dominique Ausserre, F. Paris

Proceedings Volume 2114, Laser-Induced Damage in Optical Materials: 1993; (1994) https://doi.org/10.1117/12.180922
Event: Laser-Induced Damage in Optical Materials: 1993, 1993, Boulder, CO, United States

Abstract

We have studied the changes of dielectric optical coatings after laser conditioning using atomic force microscopy (AFM). Laser coatings is the process which consists of illuminating a film by a laser below damage threshold in order to increase this threshold value. This method is implemented for optics used in high fluence laser beam such as Nd-glass lasers (1064 nm, 3 ns pulse length). We have studied e-beam evaporation deposited highly reflective multilayer ZrO₂/SiO₂ mirrors, and also single layers of SiO₂, HfO₂ and ZrO₂. We have observed the modification of the surface after laser conditioning using the AFM. We find that this process results in localized minimization or elimination of defects (nodules, craters etc...). Furthermore, the origin of the increase in the size of the hillocks observed after laser conditioning and previously reported by other groups, has been experimentally identified as an instrumental artifact.

Citation Download Citation

Anne Fornier, C. Cordillot, Dominique Ausserre, and F. Paris "Laser conditioning of optical coatings: some issues in the characterization by atomic force microscopy", Proc. SPIE 2114, Laser-Induced Damage in Optical Materials: 1993, (28 July 1994); https://doi.org/10.1117/12.180922

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