Diffusion enhanced silylation resist (DESIM): a simulator for the DESIRE process

Bhvanesh P. Mathur; Khalil I. Arshak; Arousian Arshak; Declan McDonagh

doi:10.1117/12.175364

16 May 1994 DESIM: a simulator for the DESIRE process

Bhvanesh P. Mathur, Khalil I. Arshak, Arousian Arshak, Declan McDonagh

Proceedings Volume 2195, Advances in Resist Technology and Processing XI; (1994) https://doi.org/10.1117/12.175364
Event: SPIE's 1994 Symposium on Microlithography, 1994, San Jose, CA, United States

Abstract

DESIM is an exclusive simulator for the DESIRE process. It can model all the three unit processes i.e. surface imaging (projection/contact, conventional/phase-shifted mask), silylation (positive/negative tone, gas/liquid phase, pre-silylation baking), dry development (single and two step). This paper discusses some of the models and then evaluates the performance of the simulator by comparing the simulated results.

Citation Download Citation

Bhvanesh P. Mathur, Khalil I. Arshak, Arousian Arshak, and Declan McDonagh "DESIM: a simulator for the DESIRE process", Proc. SPIE 2195, Advances in Resist Technology and Processing XI, (16 May 1994); https://doi.org/10.1117/12.175364

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