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A series of nitrogenated and nitrogen-free carbon films was prepared under various deposition conditions (substrate temperatures between 40 - 535 degree(s)C and working gas pressures between 0.09 - 5.0 Pa). Rutherford backscattering, Raman scattering, surface profilometry, ellipsometry, hardness and adhesion measurements were performed and results were related to both nitrogen and oxygen content in the layers.
Jaroslav Sobota,Jiri Hrdina,Vladimir Vorlicek,Ivan Gregora,Petr Siroky, andVratislav Perina
"Properties of rf magnetron-sputtered C and C:N thin films", Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192091
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Jaroslav Sobota, Jiri Hrdina, Vladimir Vorlicek, Ivan Gregora, Petr Siroky, Vratislav Perina, "Properties of rf magnetron-sputtered C and C:N thin films," Proc. SPIE 2253, Optical Interference Coatings, (4 November 1994); https://doi.org/10.1117/12.192091