OMNISCATR: a high-speed high-resolution three-dimensional scatterometer measures complex scatter interference and diffraction patterns

Raymond J. Castonguay

doi:10.1117/12.189218

7 October 1994 OMNISCATR^TM: a high-speed, high-resolution three-dimensional scatterometer measures complex scatter interference and diffraction patterns

Raymond J. Castonguay

Author Affiliations +

Proceedings Volume 2260, Stray Radiation in Optical Systems III; (1994) https://doi.org/10.1117/12.189218
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

With OMNISCATR's high resolution and three-dimensional light scatter measurement capabilities, a new method is now available for analyzing surface and material properties such as tooling or etching patterns, contamination, and bulk defects. Scatter data from patterned wafers, sub-micron grit particles, and defective interocular lenses is presented.

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Raymond J. Castonguay "OMNISCATR^TM: a high-speed, high-resolution three-dimensional scatterometer measures complex scatter interference and diffraction patterns", Proc. SPIE 2260, Stray Radiation in Optical Systems III, (7 October 1994); https://doi.org/10.1117/12.189218

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