SCALPEL masks

James Alexander Liddle; Myrtle I. Blakey; Kevin J. Bolan; Reginald C. Farrow; Linus A. Fetter; Leslie C. Hopkins; Harold A. Huggins; Herschel M. Marchman; Milton L. Peabody Jr.; Wayne M. Simpson; Regine G. Tarascon-Auriol; Pat G. Watson

doi:10.1117/12.195844

7 December 1994 SCALPEL masks

James Alexander Liddle, Myrtle I. Blakey, Kevin J. Bolan, Reginald C. Farrow, Linus A. Fetter, Leslie C. Hopkins, Harold A. Huggins, Herschel M. Marchman, Milton L. Peabody Jr., Wayne M. Simpson, Regine G. Tarascon-Auriol, Pat G. Watson

Author Affiliations +

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195844
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

The concept of a mask for a projection electron-beam lithography, based on the difference in scattering between two electron transparent materials -- SCALPEL^TM, has been demonstrated previously. In order to translate this initial proof-of-concept int a mask suitable for a real lithography system, it is necessary to address a large number of issues. Because of the thin membranes employed, the design of the mask, its fabrication, robustness and dimensional stability are critical issues. Cleaning and repair strategies are also affected by the mask structure. Patterning, inspection and metrology are also vital to the production of a viable mask, but these are areas of importance common to all advanced lithographies.

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James Alexander Liddle, Myrtle I. Blakey, Kevin J. Bolan, Reginald C. Farrow, Linus A. Fetter, Leslie C. Hopkins, Harold A. Huggins, Herschel M. Marchman, Milton L. Peabody Jr., Wayne M. Simpson, Regine G. Tarascon-Auriol, and Pat G. Watson "SCALPEL masks", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195844

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