Chemically amplified resist convertible into inorganic silicate glass (GPR)

Miwa Sakata; Maki Kosuge; Hideyuki Jinbo; Toshio Ito

doi:10.1117/12.210370

9 June 1995 Chemically amplified resist convertible into inorganic silicate glass (GPR)

Miwa Sakata, Maki Kosuge, Hideyuki Jinbo, Toshio Ito

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210370
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

We have developed a unique chemically amplified negative-type resist composed of poly(t- butoxysiloxane) and photoacid generator, the GPR (glass precursor resist), which can be converted into inorganic silicate glass. Poly(t-butoxysiloxane) is a specially designed SiO₂ precursor masked by t-butoxyl groups. To confirm the mechanism of condensation to SiO₂ an intermediate trapping experiment was carried out. GPR exposed at a low dose is fully developed by alkaline solution to give a positive tone; on the other hand, high-dosage GPR gives negative tone by means of organic solvent development. They correspond to the formation of poly(hydroxysilane) and SiO₂ respectively. Deprotection proceeds readily even at low temperature, whereas condensation requires thermal assistance. Decreasing the content of t-butoxyl groups enhances the sensitivities to electron beam exposure. Precursor polymers with several degrees of branching were synthesized. The high-branching polymer provides high sensitivity because its network grows abruptly with condensation. GPR has high resolution and high sensitivity. The fine patterns can be resolved with the practical dose latitude using an electron beam direct-writing system.

Citation Download Citation

Miwa Sakata, Maki Kosuge, Hideyuki Jinbo, and Toshio Ito "Chemically amplified resist convertible into inorganic silicate glass (GPR)", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210370

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