Near and sub-half-micrometer geometry SEM metrology requirements for good process control

Christopher M. Cork; Paolo Canestrari; Paolo De Natale; Mauro Vasconi

doi:10.1117/12.209238

22 May 1995 Near and sub-half-micrometer geometry SEM metrology requirements for good process control

Christopher M. Cork, Paolo Canestrari, Paolo De Natale, Mauro Vasconi

Proceedings Volume 2439, Integrated Circuit Metrology, Inspection, and Process Control IX; (1995) https://doi.org/10.1117/12.209238
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

Over the past ten years lpw kV Electron Microscopy has been the technique of choice for inprocess, critical layer metrology, for leading-edge design-rule devices. However, conventional low kY Secondary Electron microscopy is reaching its limits in its ability to measure near and sub-half micron features at all levels due to charging issues and interpretation of resist profile. A re-evaluation of the strategy for determining CD measurement site becomes increasingly important as site to site differences are more significant at these smaller dimensions. Otherwise an apparently well controlled process measured in a typical site (e.g. array of a memoiy cell) could be failing due to shorts in critical sites. These critical sites tend to challenge the limits of conventional SEM metrology more. A new generation of SEMs offering a variety of techniques to overcome these limitations has recently arrived on the market, these improve visibility and reduce the effects of charging, allowing a more accurate and representative control ofa lithographic process to be made.

Citation Download Citation

Christopher M. Cork, Paolo Canestrari, Paolo De Natale, and Mauro Vasconi "Near and sub-half-micrometer geometry SEM metrology requirements for good process control", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); https://doi.org/10.1117/12.209238

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available