Paper
22 September 1995 Modeling of defect size distribution in yield forecasting
Zhi-Min Ling, Juan Rosal, YungTao Lin, Ying Shiau
Author Affiliations +
Abstract
The impact of the defect size distribution on yield forecasting is discussed in this work. The fitting parameter p used in traditional defect size distribution modeled at X-p was studied as a function of the process layer and process time. The importance of an accurate on-line defect size measurement is also discussed.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhi-Min Ling, Juan Rosal, YungTao Lin, and Ying Shiau "Modeling of defect size distribution in yield forecasting", Proc. SPIE 2635, Microelectronic Manufacturing Yield, Reliability, and Failure Analysis, (22 September 1995); https://doi.org/10.1117/12.221463
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Cited by 1 scholarly publication.
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KEYWORDS
Semiconducting wafers

Manufacturing

Optical inspection

Calibration

Computer aided design

Mathematical modeling

Optics manufacturing

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