Room-temperature contactless electromodulation investigation of wafer-sized quantum well laser structures

Fred H. Pollak; Wojciech Krystek; M. Leibovitch; L. Malikova; Mark S. Hybertsen; R. Lum; J. M. Vandenberg; C. Lewis Reynolds Jr.

doi:10.1117/12.238981

1 May 1996 Room-temperature contactless electromodulation investigation of wafer-sized quantum well laser structures

Fred H. Pollak, Wojciech Krystek, M. Leibovitch, L. Malikova, Mark S. Hybertsen, R. Lum, J. M. Vandenberg, C. Lewis Reynolds Jr.

Author Affiliations +

Proceedings Volume 2693, Physics and Simulation of Optoelectronic Devices IV; (1996) https://doi.org/10.1117/12.238981
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

This paper reviews the use of the contactless electromodulation spectroscopy methods of photoreflectance and contactless electroreflectance for the nondestructive, room temperature investigation of wafer-scale single or multiquantum well laser structures including 0.98 micrometer InGaAs/GaAs/GaAlAs (graded index separate confinement heterostructure), 1.3 micrometer InGaAsP/InP, 0.98 micrometer InGaAs/GaAs/InGaP and 0.65 micrometer InGaP/AlInP/AlGaInP planar as well as InGaAs/GaAs/GaAlAs and GaAs/GaAlAs vertical cavity emitting samples.

Citation Download Citation

Fred H. Pollak, Wojciech Krystek, M. Leibovitch, L. Malikova, Mark S. Hybertsen, R. Lum, J. M. Vandenberg, and C. Lewis Reynolds Jr. "Room-temperature contactless electromodulation investigation of wafer-sized quantum well laser structures", Proc. SPIE 2693, Physics and Simulation of Optoelectronic Devices IV, (1 May 1996); https://doi.org/10.1117/12.238981

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