248-nm laser interaction studies on MgF2/LaF3 optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy

Axel Bodemann; Norbert Kaiser; L. Raupach; Peter Weissbrodt; Erich J. Hacker

doi:10.1117/12.240361

27 May 1996 248-nm laser interaction studies on MgF₂/LaF₃ optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy

Axel Bodemann, Norbert Kaiser, L. Raupach, Peter Weissbrodt, Erich J. Hacker

Author Affiliations +

Proceedings Volume 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995; (1996) https://doi.org/10.1117/12.240361
Event: Laser-Induced Damage in Optical Materials: 1995, 1995, Boulder, CO, United States

Abstract

A UHV surface analysis system combined with an optical setup was used in the present work to study the conditioning mechanism on MgF_2?/LaF₃ HR coatings at 248 nm excimer laser wavelength. During laser irradiation of the sample the laser-induced emission of contaminants and coating material from the sample surface was recorded by a quadrupole mass spectrometer. To analyze changes in composition and chemical bonds of the coating surface XPS-measurements were performed before, during and after irradiation in dependence on sample design, number of pulses and oxygen atmosphere.

Citation Download Citation

Axel Bodemann, Norbert Kaiser, L. Raupach, Peter Weissbrodt, and Erich J. Hacker "248-nm laser interaction studies on MgF₂/LaF₃ optical coatings by mass spectroscopy and x-ray photoelectron spectroscopy", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); https://doi.org/10.1117/12.240361

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