Narrow polydispersity polymers for microlithography: synthesis and properties

George G. Barclay; C. J. Hawker; Hiroshi Ito; Arturo J. Orellana; P. R.L. Malenfant; Roger F. Sinta

doi:10.1117/12.241823

14 June 1996 Narrow polydispersity polymers for microlithography: synthesis and properties

George G. Barclay, C. J. Hawker, Hiroshi Ito, Arturo J. Orellana, P. R.L. Malenfant, Roger F. Sinta

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241823
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

The major component of a photoresist formulation is a matrix resin, which therefore has the greatest effect on resist performance. At deep-UV wavelengths the resins of choice are linear phenolic polymers, such as poly(4-hydroxystyrene) (PHOST), which have excellent absorption characteristics within the DUV region. This paper demonstrates the synthesis of a range of narrow polydispersity PHOST polymers (M_n equals 2,000 - 30,000; PD equals 1.1 - 1.4) via a 'living' radical polymerization technique. Further, the effects of polydispersity and molecular weight on the dissolution behavior and thermal properties of these polymers are reported.

Citation Download Citation

George G. Barclay, C. J. Hawker, Hiroshi Ito, Arturo J. Orellana, P. R.L. Malenfant, and Roger F. Sinta "Narrow polydispersity polymers for microlithography: synthesis and properties", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241823

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