ArF MicroStep for 193-nm process development

Christopher Sparkes; Larry F. Thompson; Richard J. Travers

doi:10.1117/12.240933

7 June 1996 ArF MicroStep for 193-nm process development

Christopher Sparkes, Larry F. Thompson, Richard J. Travers

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240933
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

A cost effective wafer stepper system, the ArF MicroStep, has been developed for photoresist and process development at design rules of 0.18 micrometers to 0.13 micrometers using a 193 nm excimer laser illumination source. Development of the ArF MicroStep system was driven by customer requirements for a high numerical aperture exposure tool, with its configuration, specification and development mutually conducted between IC manufacturers, Integrated Solutions, Inc., and related equipment suppliers. The system was specifically designed for compatibility with imaging below 0.18 micrometers and is configured with a 10:1 catadioptic reduction objective, having variable numerical aperture from 0.4 to 0.6. During the manufacturing cycle, the ArF MicroStep and its reduction optics were characterized independently and verified to perform within the requirements of the overall system. Final system integration and test permitted verification of performance through exposures in photoresist. Exposures in a single level resist have demonstrated greater than 0.4 micrometers depth of focus for 0.16 micrometers features over the exposure field of the system, with dense structures down to 0.14 micrometers resolved by the ArF MicroStep. Using a top surface imaging process, 0.6 micrometers depth of focus has been demonstrated for 0.16 micrometers geometries, with dense structures down to 0.15 micrometers resolved.

Citation Download Citation

Christopher Sparkes, Larry F. Thompson, and Richard J. Travers "ArF MicroStep for 193-nm process development", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240933

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