Photolithography using the AERIAL illuminator in a variable-NA wafer stepper

Richard Rogoff; Guy Davies; Jan Mulkens; Jos de Klerk; Peter van Oorschot; Gabriele Kalmbach; Johannes Wangler; Wolfgang Rupp

doi:10.1117/12.240954

7 June 1996 Photolithography using the AERIAL illuminator in a variable-NA wafer stepper

Richard Rogoff, Guy Davies, Jan Mulkens, Jos de Klerk, Peter van Oorschot, Gabriele Kalmbach, Johannes Wangler, Wolfgang Rupp

Author Affiliations +

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240954
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

This paper shows the suitabilily of i-line photolithography for production at 0.30 tm. The process performance is demonstrated through the use of off-axis illumination, high NA projection lens, and a state of the art photoresist system. The minimum required depth of focus for a suitable 0.30 tm process is derived as 0.95 tm over at least a 10% process window. This will result in a 0.60 m common corridor over a square 22 mm imaging feId. In addition to the dense and isolated lines, a preliminary investigation of contact hole performance using chrome and phase shift masks was completed.

Citation Download Citation

Richard Rogoff, Guy Davies, Jan Mulkens, Jos de Klerk, Peter van Oorschot, Gabriele Kalmbach, Johannes Wangler, and Wolfgang Rupp "Photolithography using the AERIAL illuminator in a variable-NA wafer stepper", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240954

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