E-beam tandem writes short-pitch DOEs and gratings for EU-922 FOTA and other optical microsystems

Ernst-Bernhard Kley; Olivier M. Parriaux

doi:10.1117/12.248504

26 August 1996 E-beam tandem writes short-pitch DOEs and gratings for EU-922 FOTA and other optical microsystems

Ernst-Bernhard Kley, Olivier M. Parriaux

Proceedings Volume 2783, Micro-Optical Technologies for Measurement, Sensors, and Microsystems; (1996) https://doi.org/10.1117/12.248504
Event: Lasers, Optics, and Vision for Productivity in Manufacturing I, 1996, Besancon, France

Abstract

Short grating period and high spatial frequency zones in holograms are features which diffractive elements must exhibit to be considered as the core of future optical microsystems. Wavelength scale feature size is the way to system miniaturization, to large aperture and high efficiency as well as to simplicity. The implication is a systematic resort to electron beam lithography (EBL). A tandem of two EBL tools is shown to fit the specific requirements of diffractive optics and to allow the exploitation of the application potential of this technology.

Citation Download Citation

Ernst-Bernhard Kley and Olivier M. Parriaux "E-beam tandem writes short-pitch DOEs and gratings for EU-922 FOTA and other optical microsystems", Proc. SPIE 2783, Micro-Optical Technologies for Measurement, Sensors, and Microsystems, (26 August 1996); https://doi.org/10.1117/12.248504

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